Mechanical and optical properties of oxide thin films deposited by pulsed laser reactive evaporation

The optical and mechanical properties of SiO 2, Al 2O 3 and TiO 2 films deposited by pulsed laser evaporation (TEA CO 2 laser) as well as by normal thermal evaporation (electron-gun) have been measured. The optical absorption and scattering losses of the films at 611 nm wavelength are determined fro...

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Bibliographic Details
Published in:Vacuum 1990, Vol.40 (4), p.399-405
Main Authors: Shi, L., Frankena, H.J., Mulder, H.
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Exact sciences and technology
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Optical properties of specific thin films
Physics
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Summary:The optical and mechanical properties of SiO 2, Al 2O 3 and TiO 2 films deposited by pulsed laser evaporation (TEA CO 2 laser) as well as by normal thermal evaporation (electron-gun) have been measured. The optical absorption and scattering losses of the films at 611 nm wavelength are determined from a precise reflection/transmission measurement. The refractive indices of the films are estimated from their reflection spectra. The adhesion strength and abrasion-resistance of the films have been evaluated quantitatively, the former using a pull test method. A modified rub test method is described which gives a quantitative indication for a wide range of the abrasion-resistances of thin films.
ISSN:0042-207X
1879-2715
DOI:10.1016/0042-207X(90)90099-K