Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films

• Published in: Thin solid films 1992-07, Vol.215 (1), p.1-7
• Main Authors: Kuznetsov, M.V., Zhuravlev, M.V., Shalayeva, E.V., Gubanov, V.A.
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physics; Solid surfaces and solid-solid interfaces; Surface and interface dynamics and vibrations; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/0040-6090(92)90692-5

The composition, structure and electronic structure of TiN films synthesized by the arc method have been studied by means of X-ray photoelectron spectroscopy (XPS) and electron microscopy. Dependences of the film composition and structure on the deposition parameters (working gas pressure, potential and temperature of the substrate, cathode current) were obtained. Also established was the dependence of the binding energy changes of the Ti 2p and N 1s core electron levels and valence band on the nitrogen content in nitride films. With increasing nitrogen concentration, the XPS Ti 2p line was found to be chemically shifted toward higher binding energies (from 454.1 eV for titanium to 455.2 eV for TiN 0.81), which provides evidence that, during TiN x formation, the positive effective charge on titanium atoms increases.