Plasma Nitriding of Sputtered Titanium Films

Ion nitriding of thin titanium films is discussed. The Ti films prepared by dc magnetron sputtering under different conditions were nitrided in a dc glow discharge in an N sub 2 --H sub 2 (1:1) mixture at a total pressure of 8 torr. Special attention is given to investigation of the phase compositio...

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Bibliographic Details
Published in:Materials science & engineering. A, Structural materials : properties, microstructure and processing Structural materials : properties, microstructure and processing, 1992-10, Vol.A163 (2), p.181-186
Main Authors: Musil, J, Vlcek, V, Jezek, V, Kubasek, M, Cerstvy, R, Tolg, T, Benda, M, Kolega, M, Musil, J Jr
Format: Article
Language:English
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Summary:Ion nitriding of thin titanium films is discussed. The Ti films prepared by dc magnetron sputtering under different conditions were nitrided in a dc glow discharge in an N sub 2 --H sub 2 (1:1) mixture at a total pressure of 8 torr. Special attention is given to investigation of the phase composition of the films using X-ray diffraction to the chemical composition using EDAX and to the surface topography using scanning electron microscopy.
ISSN:0921-5093