Preparation and characterization of V-N films deposited by reactive triode magnetron sputtering

V--N coatings were produced by high density triode magnetron sputtering in the reactive mode. The influence of basic deposition parameters, mainly nitrogen partial pressure, on the composition, crystal structure and hardness of the V--N films were investigated using electron probe microanalysis, X-r...

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Bibliographic Details
Published in:Surface & coatings technology 1992-11, Vol.54-55 (1-3), p.115-120
Main Authors: FARGES, G, BEAUPREZ, E, DEGOUT, D
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Metals. Metallurgy
Nonmetallic coatings
Production techniques
Surface treatment
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Summary:V--N coatings were produced by high density triode magnetron sputtering in the reactive mode. The influence of basic deposition parameters, mainly nitrogen partial pressure, on the composition, crystal structure and hardness of the V--N films were investigated using electron probe microanalysis, X-ray diffraction and Vickers microhardness testing. The film deposition rate was measured by means of optical emission spectroscopy and a quartz film thickness monitor. The beta -V sub 2 N sub x phase was obtained for x in the range 0.38-0.50. The delta -VN sub x phase was identified for coatings containing 42.2-48 at.% nitrogen. The texture of delta -VN sub x coatings changed from a strong preferential orientation < 200 > to mixed < 111 > and < 200 > and finally to < 200 > for N-rich coatings. The highest Vickers microhardness, 3600 HV 0.1, was measured for coatings containing in the range 33.3-42.2 at.% N. Tool steel Z85WDCB06.05.05.02 was used as the substrate.
ISSN:0257-8972
1879-3347
DOI:10.1016/0257-8972(92)90149-5