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Epitaxial growth of Be on α-Al2O3
We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a va...
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Published in: | Applied physics letters 1992-06, Vol.60 (24), p.2995-2997 |
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container_title | Applied physics letters |
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creator | RUFFNER, J. A SLAUGHTER, J. M FALCO, C. M |
description | We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a variety of x-ray diffraction techniques. The in-plane orientation of films grown at substrate temperatures T in the range 10 °C |
doi_str_mv | 10.1063/1.106787 |
format | article |
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A ; SLAUGHTER, J. M ; FALCO, C. M</creator><creatorcontrib>RUFFNER, J. A ; SLAUGHTER, J. M ; FALCO, C. M</creatorcontrib><description>We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a variety of x-ray diffraction techniques. The in-plane orientation of films grown at substrate temperatures T in the range 10 °C<T<270 °C is Be[11̄00] ∥α-Al2O3[12̄10] and Be[12̄10] ∥α-Al2O3[11̄00], while at T=500 °C the Be is aligned with the substrate. At T=10 °C the films are smooth, but the roughness increases with increasing T. At T=500 °C the crystal perfection improves dramatically but the Be forms large islands.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.106787</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>Melville, NY: American Institute of Physics</publisher><subject>Applied sciences ; Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Metals. 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A</creatorcontrib><creatorcontrib>SLAUGHTER, J. M</creatorcontrib><creatorcontrib>FALCO, C. M</creatorcontrib><title>Epitaxial growth of Be on α-Al2O3</title><title>Applied physics letters</title><description>We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a variety of x-ray diffraction techniques. The in-plane orientation of films grown at substrate temperatures T in the range 10 °C<T<270 °C is Be[11̄00] ∥α-Al2O3[12̄10] and Be[12̄10] ∥α-Al2O3[11̄00], while at T=500 °C the Be is aligned with the substrate. At T=10 °C the films are smooth, but the roughness increases with increasing T. At T=500 °C the crystal perfection improves dramatically but the Be forms large islands.</description><subject>Applied sciences</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Metals. Metallurgy</subject><subject>Physics</subject><subject>Solid surfaces and solid-solid interfaces</subject><subject>Surface and interface dynamics and vibrations</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film structure and morphology</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1992</creationdate><recordtype>article</recordtype><recordid>eNo9kMtKw0AYRgdRMFbBRwgi4iY6_0zmtqylXqDQja6Hyd8ZjaRJnElRH8sX8ZlMaXF1-OBwFh8h50BvgEp-C1sorQ5IBlSpggPoQ5JRSnkhjYBjcpLS-zgF4zwjF_O-HtxX7Zr8NXafw1vehfzO512b__4U04Yt-Sk5Cq5J_mzPCXm5nz_PHovF8uFpNl0UyLQaCoNSelUxGlboJaO-YuCBotBBIBpXlhyrSlUaZZDBO6NWVTCUUdTSAPN8Qq523T52HxufBruuE_qmca3vNskyobmE0ozi9U7E2KUUfbB9rNcuflugdnuCBbs7YVQv902X0DUhuhbr9O8LXhomFP8DtnFZaw</recordid><startdate>19920615</startdate><enddate>19920615</enddate><creator>RUFFNER, J. A</creator><creator>SLAUGHTER, J. M</creator><creator>FALCO, C. M</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>19920615</creationdate><title>Epitaxial growth of Be on α-Al2O3</title><author>RUFFNER, J. A ; SLAUGHTER, J. M ; FALCO, C. M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c287t-9c66e7b20fdce620eb21e10c58f5cc9a443cbb7b8c6f6fea97dbf9020c86912e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1992</creationdate><topic>Applied sciences</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Metals. Metallurgy</topic><topic>Physics</topic><topic>Solid surfaces and solid-solid interfaces</topic><topic>Surface and interface dynamics and vibrations</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>RUFFNER, J. A</creatorcontrib><creatorcontrib>SLAUGHTER, J. M</creatorcontrib><creatorcontrib>FALCO, C. M</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>RUFFNER, J. A</au><au>SLAUGHTER, J. M</au><au>FALCO, C. M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Epitaxial growth of Be on α-Al2O3</atitle><jtitle>Applied physics letters</jtitle><date>1992-06-15</date><risdate>1992</risdate><volume>60</volume><issue>24</issue><spage>2995</spage><epage>2997</epage><pages>2995-2997</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a variety of x-ray diffraction techniques. The in-plane orientation of films grown at substrate temperatures T in the range 10 °C<T<270 °C is Be[11̄00] ∥α-Al2O3[12̄10] and Be[12̄10] ∥α-Al2O3[11̄00], while at T=500 °C the Be is aligned with the substrate. At T=10 °C the films are smooth, but the roughness increases with increasing T. At T=500 °C the crystal perfection improves dramatically but the Be forms large islands.</abstract><cop>Melville, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.106787</doi><tpages>3</tpages></addata></record> |
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subjects | Applied sciences Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Metals. Metallurgy Physics Solid surfaces and solid-solid interfaces Surface and interface dynamics and vibrations Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology |
title | Epitaxial growth of Be on α-Al2O3 |
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