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Epitaxial growth of Be on α-Al2O3

We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a va...

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Published in:Applied physics letters 1992-06, Vol.60 (24), p.2995-2997
Main Authors: RUFFNER, J. A, SLAUGHTER, J. M, FALCO, C. M
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cited_by cdi_FETCH-LOGICAL-c287t-9c66e7b20fdce620eb21e10c58f5cc9a443cbb7b8c6f6fea97dbf9020c86912e3
cites cdi_FETCH-LOGICAL-c287t-9c66e7b20fdce620eb21e10c58f5cc9a443cbb7b8c6f6fea97dbf9020c86912e3
container_end_page 2997
container_issue 24
container_start_page 2995
container_title Applied physics letters
container_volume 60
creator RUFFNER, J. A
SLAUGHTER, J. M
FALCO, C. M
description We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a variety of x-ray diffraction techniques. The in-plane orientation of films grown at substrate temperatures T in the range 10 °C
doi_str_mv 10.1063/1.106787
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_25836149</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>25836149</sourcerecordid><originalsourceid>FETCH-LOGICAL-c287t-9c66e7b20fdce620eb21e10c58f5cc9a443cbb7b8c6f6fea97dbf9020c86912e3</originalsourceid><addsrcrecordid>eNo9kMtKw0AYRgdRMFbBRwgi4iY6_0zmtqylXqDQja6Hyd8ZjaRJnElRH8sX8ZlMaXF1-OBwFh8h50BvgEp-C1sorQ5IBlSpggPoQ5JRSnkhjYBjcpLS-zgF4zwjF_O-HtxX7Zr8NXafw1vehfzO512b__4U04Yt-Sk5Cq5J_mzPCXm5nz_PHovF8uFpNl0UyLQaCoNSelUxGlboJaO-YuCBotBBIBpXlhyrSlUaZZDBO6NWVTCUUdTSAPN8Qq523T52HxufBruuE_qmca3vNskyobmE0ozi9U7E2KUUfbB9rNcuflugdnuCBbs7YVQv902X0DUhuhbr9O8LXhomFP8DtnFZaw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>25836149</pqid></control><display><type>article</type><title>Epitaxial growth of Be on α-Al2O3</title><source>AIP Digital Archive</source><creator>RUFFNER, J. A ; SLAUGHTER, J. M ; FALCO, C. M</creator><creatorcontrib>RUFFNER, J. A ; SLAUGHTER, J. M ; FALCO, C. M</creatorcontrib><description>We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a variety of x-ray diffraction techniques. The in-plane orientation of films grown at substrate temperatures T in the range 10 °C&lt;T&lt;270 °C is Be[11̄00] ∥α-Al2O3[12̄10] and Be[12̄10] ∥α-Al2O3[11̄00], while at T=500 °C the Be is aligned with the substrate. At T=10 °C the films are smooth, but the roughness increases with increasing T. At T=500 °C the crystal perfection improves dramatically but the Be forms large islands.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.106787</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>Melville, NY: American Institute of Physics</publisher><subject>Applied sciences ; Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Metals. Metallurgy ; Physics ; Solid surfaces and solid-solid interfaces ; Surface and interface dynamics and vibrations ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film structure and morphology</subject><ispartof>Applied physics letters, 1992-06, Vol.60 (24), p.2995-2997</ispartof><rights>1992 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c287t-9c66e7b20fdce620eb21e10c58f5cc9a443cbb7b8c6f6fea97dbf9020c86912e3</citedby><cites>FETCH-LOGICAL-c287t-9c66e7b20fdce620eb21e10c58f5cc9a443cbb7b8c6f6fea97dbf9020c86912e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,27905,27906</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=5349257$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>RUFFNER, J. A</creatorcontrib><creatorcontrib>SLAUGHTER, J. M</creatorcontrib><creatorcontrib>FALCO, C. M</creatorcontrib><title>Epitaxial growth of Be on α-Al2O3</title><title>Applied physics letters</title><description>We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a variety of x-ray diffraction techniques. The in-plane orientation of films grown at substrate temperatures T in the range 10 °C&lt;T&lt;270 °C is Be[11̄00] ∥α-Al2O3[12̄10] and Be[12̄10] ∥α-Al2O3[11̄00], while at T=500 °C the Be is aligned with the substrate. At T=10 °C the films are smooth, but the roughness increases with increasing T. At T=500 °C the crystal perfection improves dramatically but the Be forms large islands.</description><subject>Applied sciences</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Metals. Metallurgy</subject><subject>Physics</subject><subject>Solid surfaces and solid-solid interfaces</subject><subject>Surface and interface dynamics and vibrations</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film structure and morphology</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1992</creationdate><recordtype>article</recordtype><recordid>eNo9kMtKw0AYRgdRMFbBRwgi4iY6_0zmtqylXqDQja6Hyd8ZjaRJnElRH8sX8ZlMaXF1-OBwFh8h50BvgEp-C1sorQ5IBlSpggPoQ5JRSnkhjYBjcpLS-zgF4zwjF_O-HtxX7Zr8NXafw1vehfzO512b__4U04Yt-Sk5Cq5J_mzPCXm5nz_PHovF8uFpNl0UyLQaCoNSelUxGlboJaO-YuCBotBBIBpXlhyrSlUaZZDBO6NWVTCUUdTSAPN8Qq523T52HxufBruuE_qmca3vNskyobmE0ozi9U7E2KUUfbB9rNcuflugdnuCBbs7YVQv902X0DUhuhbr9O8LXhomFP8DtnFZaw</recordid><startdate>19920615</startdate><enddate>19920615</enddate><creator>RUFFNER, J. A</creator><creator>SLAUGHTER, J. M</creator><creator>FALCO, C. M</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>19920615</creationdate><title>Epitaxial growth of Be on α-Al2O3</title><author>RUFFNER, J. A ; SLAUGHTER, J. M ; FALCO, C. M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c287t-9c66e7b20fdce620eb21e10c58f5cc9a443cbb7b8c6f6fea97dbf9020c86912e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1992</creationdate><topic>Applied sciences</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Metals. Metallurgy</topic><topic>Physics</topic><topic>Solid surfaces and solid-solid interfaces</topic><topic>Surface and interface dynamics and vibrations</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>RUFFNER, J. A</creatorcontrib><creatorcontrib>SLAUGHTER, J. M</creatorcontrib><creatorcontrib>FALCO, C. M</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>RUFFNER, J. A</au><au>SLAUGHTER, J. M</au><au>FALCO, C. M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Epitaxial growth of Be on α-Al2O3</atitle><jtitle>Applied physics letters</jtitle><date>1992-06-15</date><risdate>1992</risdate><volume>60</volume><issue>24</issue><spage>2995</spage><epage>2997</epage><pages>2995-2997</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>We report the growth of epitaxial single-crystal (0001) hcp-Be on (0001) α-Al2O3 substrates using molecular beam epitaxy. Thin films were characterized in situ with reflection high energy electron diffraction, and ex situ with ion beam analysis, electron microscopy, atomic force microscopy, and a variety of x-ray diffraction techniques. The in-plane orientation of films grown at substrate temperatures T in the range 10 °C&lt;T&lt;270 °C is Be[11̄00] ∥α-Al2O3[12̄10] and Be[12̄10] ∥α-Al2O3[11̄00], while at T=500 °C the Be is aligned with the substrate. At T=10 °C the films are smooth, but the roughness increases with increasing T. At T=500 °C the crystal perfection improves dramatically but the Be forms large islands.</abstract><cop>Melville, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.106787</doi><tpages>3</tpages></addata></record>
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1077-3118
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subjects Applied sciences
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Metals. Metallurgy
Physics
Solid surfaces and solid-solid interfaces
Surface and interface dynamics and vibrations
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
title Epitaxial growth of Be on α-Al2O3
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T14%3A27%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Epitaxial%20growth%20of%20Be%20on%20%CE%B1-Al2O3&rft.jtitle=Applied%20physics%20letters&rft.au=RUFFNER,%20J.%20A&rft.date=1992-06-15&rft.volume=60&rft.issue=24&rft.spage=2995&rft.epage=2997&rft.pages=2995-2997&rft.issn=0003-6951&rft.eissn=1077-3118&rft.coden=APPLAB&rft_id=info:doi/10.1063/1.106787&rft_dat=%3Cproquest_cross%3E25836149%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c287t-9c66e7b20fdce620eb21e10c58f5cc9a443cbb7b8c6f6fea97dbf9020c86912e3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=25836149&rft_id=info:pmid/&rfr_iscdi=true