Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through in phase mask

A photolithographic method is described for fabricating refractive index Bragg gratings in photosensitive optical fiber by using a special phase mask grating made of silica glass. A KrF excimer laser beam (249 nm) at normal incidence is modulated spatially by the phase mask grating. The diffracted l...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics letters 1993-03, Vol.62 (10), p.1035-1037
Main Authors: HILL, K. O, MALO, B, BILODEAU, F, JOHNSON, D. C, ALBERT, J
Format: Article
Language:English
Subjects:
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Gratings
Optical elements, devices, and systems
Optics
Physics
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A photolithographic method is described for fabricating refractive index Bragg gratings in photosensitive optical fiber by using a special phase mask grating made of silica glass. A KrF excimer laser beam (249 nm) at normal incidence is modulated spatially by the phase mask grating. The diffracted light, which forms a periodic, high-contrast intensity pattern with half the phase mask grating pitch, photoimprints a refractive index modulation into the core of photosensitive fiber placed behind, in proximity, and parallel, to the mask; the phase mask grating striations are oriented normal to the fiber axis. This method of fabricating in-fiber Bragg gratings is flexible, simple to use, results in reduced mechanical sensitivity of the grating writing apparatus and is functional even with low spatial and temporal coherence laser sources.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.108786