Chemically vapor deposited diamond as a cutting tool material— a study of failure mechanisms

A study of wear mechanisms in chemically vapor deposited thin film diamond on silicon nitride on turning in aluminum-18% silicon is presented. The cutting process was interrupted at intervals and the edges of the cutting tool inserts were characterized in a scanning electron microscope. Two testing...

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Published in:Surface & coatings technology 1993-04, Vol.57 (1), p.47-50
Main Authors: Reineck, Ingrid, Söderberg, Staffan, Ekholm, Per-Erik, Westergren, Kenneth
Format: Article
Language:English
Subjects:
Applied sciences
Cutting
Exact sciences and technology
Machining. Machinability
Metals. Metallurgy
Production techniques
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description A study of wear mechanisms in chemically vapor deposited thin film diamond on silicon nitride on turning in aluminum-18% silicon is presented. The cutting process was interrupted at intervals and the edges of the cutting tool inserts were characterized in a scanning electron microscope. Two testing methods are compared: longitudinal turning and, as an accelerated test, a facing operation. In these tests two competitive mechanisms can be observed: the attrition of one or a few grains at a time and the formation of cracks.
doi_str_mv 10.1016/0257-8972(93)90335-L
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subjects Applied sciences
Cutting
Exact sciences and technology
Machining. Machinability
Metals. Metallurgy
Production techniques
title Chemically vapor deposited diamond as a cutting tool material— a study of failure mechanisms
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