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Some properties of aluminium-nitride powder prepared by metal-organic chemical vapour deposition
Ultrafine aluminium-nitride (AlN) powders with primary particle sizes of 10–20 nm were prepared by a metal-organic chemical vapour deposition (MOCVD): trimethylaluminium (Al(CH 3) 3), triethylaluminium (Al(C 2H 5) 3) and triisobutylaluminium (Al(i-C 4H 9) 3)-vapours were reacted with ammonia (NH 3)...
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Published in: | Journal of the European Ceramic Society 1995, Vol.15 (7), p.661-666 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Ultrafine aluminium-nitride (AlN) powders with primary particle sizes of 10–20 nm were prepared by a metal-organic chemical vapour deposition (MOCVD): trimethylaluminium (Al(CH
3)
3), triethylaluminium (Al(C
2H
5)
3) and triisobutylaluminium (Al(i-C
4H
9)
3)-vapours were reacted with ammonia (NH
3) at 1050 °C. The sintered compacts with relative densities of ~95% could be fabricated by firing these compressed powders at temperatures as low as 1600 °C. The relative densities of the Al(CH
3)
3-derived and Al(C
2H
5)
3-derived compacts fired at 1800 °C for 10 h attained ~98%. The oxygen contents of these compacts were 1.8 and 4.7%, respectively. |
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ISSN: | 0955-2219 1873-619X |
DOI: | 10.1016/0955-2219(95)00039-W |