Area-Selective Chemical Doping on Solution-Processed MoS2 Thin-Film for Multi-Valued Logic Gates

Multi-valued logic gates are demonstrated on solution-processed molybdenum disulfide (MoS2) thin films. A simple chemical doping process is added to the conventional transistor fabrication procedure to locally increase the work function of MoS2 by decreasing sulfur vacancies. The resulting device ex...

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Bibliographic Details
Published in:Nano letters 2022-01, Vol.22 (2), p.570-577
Main Authors: Kim, Jihyun, Jung, Myeongjin, Lim, Dong Un, Rhee, Dongjoon, Jung, Sung Hyeon, Cho, Hyung Koun, Kim, Han-Ki, Cho, Jeong Ho, Kang, Joohoon
Format: Article
Language:English
Online Access:Get full text
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Summary:Multi-valued logic gates are demonstrated on solution-processed molybdenum disulfide (MoS2) thin films. A simple chemical doping process is added to the conventional transistor fabrication procedure to locally increase the work function of MoS2 by decreasing sulfur vacancies. The resulting device exhibits pseudo-heterojunctions comprising as-processed MoS2 and chemically treated MoS2 (c-MoS2). The energy-band misalignment of MoS2 and c-MoS2 results in a sequential activation of the MoS2 and c-MoS2 channel areas under a gate voltage sweep, which generates a stable intermediate state for ternary operation. Current levels and turn-on voltages for each state can be tuned by modulating the device geometries, including the channel thickness and length. The optimized ternary transistors are incorporated to demonstrate various ternary logic gates, including the inverter, NMIN, and NMAX gates.
ISSN:1530-6984
1530-6992
DOI:10.1021/acs.nanolett.1c02947