Fabrication of extremely thin silicon on insulator for fully-depleted CMOS applications

A technique to produce extremely thin (

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Bibliographic Details
Published in:Thin solid films 1993-09, Vol.232 (1), p.105-109, Article 105
Main Authors: Bindal, A., Rovedo, N., Restivo, J., Galli, C., Ogura, S.
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Description
Summary:A technique to produce extremely thin (
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(93)90770-P