Thermal stability of on-chip copper interconnect structures

Copper metallization for on-chip multilevel interconnects is receiving increasing attention for future generations of integrated circuits (ICs), with advantages of low line resistance, low interconnect delay, high electromigration resistance and, possibly, overall back-end process simplicity. Howeve...

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Bibliographic Details
Published in:Thin solid films 1995-06, Vol.262 (1), p.177-186
Main Authors: Gutmann, Ronald J., Chow, T.Paul, Kaloyeros, Alain E., Lanford, William A., Muraka, Shyam P.
Format: Article
Language:English
Subjects:
Copper
Metalliation
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Summary:Copper metallization for on-chip multilevel interconnects is receiving increasing attention for future generations of integrated circuits (ICs), with advantages of low line resistance, low interconnect delay, high electromigration resistance and, possibly, overall back-end process simplicity. However, copper introduces a set of processing and manufacturing issues which must be addressed in the research and development phases of the technology, including thermal stability of interconnect structure. This paper summarizes the most likely processing steps for integrating copper metallization into IC technology and presents the current status of thermal-stability investigations that impact manufacturing issues (materials, unit processing and processintegration issues).
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(95)05841-9