Large-area diamond film growth in a low-pressure flame

Chemical vapor deposition of a large-area (13 cm 2) polycrystalline diamond film by a low-pressure combustion technique has been demonstrated. Good film quality and uniformity are observed, and the technique offers several advantages over other large-area deposition methods, including simple scalabi...

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Bibliographic Details
Published in:Materials letters 1993-12, Vol.18 (3), p.119-122
Main Authors: Glumac, N.G., Goodwin, D.G.
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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Summary:Chemical vapor deposition of a large-area (13 cm 2) polycrystalline diamond film by a low-pressure combustion technique has been demonstrated. Good film quality and uniformity are observed, and the technique offers several advantages over other large-area deposition methods, including simple scalability up to arbitrarily large substrates.
ISSN:0167-577X
1873-4979
DOI:10.1016/0167-577X(93)90109-B