In situ observations of oxygen adsorption on a Cu(100) substrate using atomic force microscopy

In situ atomic force microscopy (AFM) images of Cu(100) single crystals in dilute acid solutions reveal that a ( 2 × 2 ) R45° adlattice is formed on this material at negative potentials. This adlattice can be removed by sweeping the potential of the Cu(100) surface approximately 0.5 V negative of th...

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Bibliographic Details
Published in:Surface science 1993-01, Vol.281 (1), p.L308-L314
Main Authors: Cruickshank, B.J., Sneddon, Douglas D., Gewirth, Andrew A.
Format: Article
Language:English
Subjects:
Adsorption
Chemistry
Electrochemistry
Exact sciences and technology
General and physical chemistry
Study of interfaces
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Summary:In situ atomic force microscopy (AFM) images of Cu(100) single crystals in dilute acid solutions reveal that a ( 2 × 2 ) R45° adlattice is formed on this material at negative potentials. This adlattice can be removed by sweeping the potential of the Cu(100) surface approximately 0.5 V negative of the open circuit potential. Based on the insensitivity of the ( 2 × 2 ) R45° structure to electrolyte and electrode surface preparation, and our data showing that Cu(111) surfaces in the same acidic solution exhibit only the hexagonal Cu lattice, we associate the overlayer with adsorbed O or OH −, in which the oxygen is chemisorbed in alternate 4-fold hollow sites. AFM images of monatomic steps in an electrochemical environment are reported.
ISSN:0039-6028
1879-2758
DOI:10.1016/0039-6028(93)90845-B