Nanometer scale fabrication in mercury cadmium telluride using methane/hydrogen electron cyclotron resonance microwave plasmas

The fabrication of nanometer scale features in the narrow gap, compound semiconductor mercury cadmium telluride has been demonstrated through the application of e-beam lithography and reactive ion etching with an electron cyclotron resonance (ECR) microwave generated methane/hydrogen plasma. The eff...

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Bibliographic Details
Published in:Applied physics letters 1993-05, Vol.62 (19), p.2362-2364
Main Authors: EDDY, C. R, DOBISZ, E. A, HOFFMAN, C. A, MEYER, J. R
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Mechanical and acoustical properties
adhesion
Physics
Solid surfaces and solid-solid interfaces
Solid-fluid interfaces
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Summary:The fabrication of nanometer scale features in the narrow gap, compound semiconductor mercury cadmium telluride has been demonstrated through the application of e-beam lithography and reactive ion etching with an electron cyclotron resonance (ECR) microwave generated methane/hydrogen plasma. The effects of methane concentration, substrate bias, total pressure, and substrate position with respect to the ECR condition on etch rate, anisotropy, and overall etch performance have been examined. The optimized process resulting from these studies has produced the first mercury-based nanostructures consisting of 30–60 nm features with sidewall angles of 88°.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.109390