Loading…
Reduction of leakage current and minority carrier lifetime in platinum-diffused pn diodes
We propose a novel method to control the depth profiles of platinum-related trap concentration in platinum-diffused silicon p + n diodes and to improve their electrical properties, leakage current and lifetime. Platinum has been introduced into silicon wafers and p + n diodes by one- or two-step hea...
Saved in:
Published in: | JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP 1993-09, Vol.32 (9A), p.3760-3763 |
---|---|
Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c388t-23caeccaadbcf177adcdba620bd5bef019f7ff1db5ab4d515ba45bdf41b76973 |
---|---|
cites | cdi_FETCH-LOGICAL-c388t-23caeccaadbcf177adcdba620bd5bef019f7ff1db5ab4d515ba45bdf41b76973 |
container_end_page | 3763 |
container_issue | 9A |
container_start_page | 3760 |
container_title | JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP |
container_volume | 32 |
creator | SAGALA, P KUWANO, H |
description | We propose a novel method to control the depth profiles of platinum-related trap concentration in platinum-diffused silicon
p
+
n
diodes and to improve their electrical properties, leakage current and lifetime. Platinum has been introduced into silicon wafers and
p
+
n
diodes by one- or two-step heat treatment. The experimental results show that we can simultaneously minimize the leakage current and minority carrier lifetime, especially by the two-step heat treatment. This is the first proposal to overcome the trade-off relationship between the leakage current and lifetime. The experiment also proves that the dominant level for both the leakage current and minority carrier lifetime is a level at Ec-0.52 eV. |
doi_str_mv | 10.1143/jjap.32.3760 |
format | article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_26190359</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>26190359</sourcerecordid><originalsourceid>FETCH-LOGICAL-c388t-23caeccaadbcf177adcdba620bd5bef019f7ff1db5ab4d515ba45bdf41b76973</originalsourceid><addsrcrecordid>eNo9kEtLw0AYRQdRsFZ3_oBZiCtT55k0y1J8lYIi3bgavnnJ1GQSZ5JF_70tLa4uF849i4vQLSUzSgV_3G6hn3E241VJztCEclEVgpTyHE0IYbQQNWOX6Crn7b6WUtAJ-vp0djRD6CLuPG4c_MC3w2ZMycUBQ7S4DbFLYdhhAykFl3ATvBtC63CIuG9gCHFsCxu8H7OzuI_Yhs66fI0uPDTZ3ZxyijbPT5vla7F-f3lbLtaF4fP5UDBuwBkDYLXxtKrAGquhZERbqZ0ntPaV99RqCVpYSaUGIbX1guqqrCs-RfdHbZ-639HlQbUhG9c0EF03ZsVKWhMu6z34cARN6nJOzqs-hRbSTlGiDvep1WrxoThTh_v2-N3JC9lA4xNEE_L_hteUUin4H6cLct0</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>26190359</pqid></control><display><type>article</type><title>Reduction of leakage current and minority carrier lifetime in platinum-diffused pn diodes</title><source>IOPscience journals</source><source>Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)</source><creator>SAGALA, P ; KUWANO, H</creator><creatorcontrib>SAGALA, P ; KUWANO, H</creatorcontrib><description>We propose a novel method to control the depth profiles of platinum-related trap concentration in platinum-diffused silicon
p
+
n
diodes and to improve their electrical properties, leakage current and lifetime. Platinum has been introduced into silicon wafers and
p
+
n
diodes by one- or two-step heat treatment. The experimental results show that we can simultaneously minimize the leakage current and minority carrier lifetime, especially by the two-step heat treatment. This is the first proposal to overcome the trade-off relationship between the leakage current and lifetime. The experiment also proves that the dominant level for both the leakage current and minority carrier lifetime is a level at Ec-0.52 eV.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.32.3760</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Applied sciences ; Compound structure devices ; Electronics ; Exact sciences and technology ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><ispartof>JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP, 1993-09, Vol.32 (9A), p.3760-3763</ispartof><rights>1994 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c388t-23caeccaadbcf177adcdba620bd5bef019f7ff1db5ab4d515ba45bdf41b76973</citedby><cites>FETCH-LOGICAL-c388t-23caeccaadbcf177adcdba620bd5bef019f7ff1db5ab4d515ba45bdf41b76973</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3911154$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>SAGALA, P</creatorcontrib><creatorcontrib>KUWANO, H</creatorcontrib><title>Reduction of leakage current and minority carrier lifetime in platinum-diffused pn diodes</title><title>JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP</title><description>We propose a novel method to control the depth profiles of platinum-related trap concentration in platinum-diffused silicon
p
+
n
diodes and to improve their electrical properties, leakage current and lifetime. Platinum has been introduced into silicon wafers and
p
+
n
diodes by one- or two-step heat treatment. The experimental results show that we can simultaneously minimize the leakage current and minority carrier lifetime, especially by the two-step heat treatment. This is the first proposal to overcome the trade-off relationship between the leakage current and lifetime. The experiment also proves that the dominant level for both the leakage current and minority carrier lifetime is a level at Ec-0.52 eV.</description><subject>Applied sciences</subject><subject>Compound structure devices</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1993</creationdate><recordtype>article</recordtype><recordid>eNo9kEtLw0AYRQdRsFZ3_oBZiCtT55k0y1J8lYIi3bgavnnJ1GQSZ5JF_70tLa4uF849i4vQLSUzSgV_3G6hn3E241VJztCEclEVgpTyHE0IYbQQNWOX6Crn7b6WUtAJ-vp0djRD6CLuPG4c_MC3w2ZMycUBQ7S4DbFLYdhhAykFl3ATvBtC63CIuG9gCHFsCxu8H7OzuI_Yhs66fI0uPDTZ3ZxyijbPT5vla7F-f3lbLtaF4fP5UDBuwBkDYLXxtKrAGquhZERbqZ0ntPaV99RqCVpYSaUGIbX1guqqrCs-RfdHbZ-639HlQbUhG9c0EF03ZsVKWhMu6z34cARN6nJOzqs-hRbSTlGiDvep1WrxoThTh_v2-N3JC9lA4xNEE_L_hteUUin4H6cLct0</recordid><startdate>19930901</startdate><enddate>19930901</enddate><creator>SAGALA, P</creator><creator>KUWANO, H</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19930901</creationdate><title>Reduction of leakage current and minority carrier lifetime in platinum-diffused pn diodes</title><author>SAGALA, P ; KUWANO, H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c388t-23caeccaadbcf177adcdba620bd5bef019f7ff1db5ab4d515ba45bdf41b76973</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1993</creationdate><topic>Applied sciences</topic><topic>Compound structure devices</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>SAGALA, P</creatorcontrib><creatorcontrib>KUWANO, H</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>SAGALA, P</au><au>KUWANO, H</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Reduction of leakage current and minority carrier lifetime in platinum-diffused pn diodes</atitle><jtitle>JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP</jtitle><date>1993-09-01</date><risdate>1993</risdate><volume>32</volume><issue>9A</issue><spage>3760</spage><epage>3763</epage><pages>3760-3763</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>We propose a novel method to control the depth profiles of platinum-related trap concentration in platinum-diffused silicon
p
+
n
diodes and to improve their electrical properties, leakage current and lifetime. Platinum has been introduced into silicon wafers and
p
+
n
diodes by one- or two-step heat treatment. The experimental results show that we can simultaneously minimize the leakage current and minority carrier lifetime, especially by the two-step heat treatment. This is the first proposal to overcome the trade-off relationship between the leakage current and lifetime. The experiment also proves that the dominant level for both the leakage current and minority carrier lifetime is a level at Ec-0.52 eV.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.32.3760</doi><tpages>4</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-4922 |
ispartof | JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP, 1993-09, Vol.32 (9A), p.3760-3763 |
issn | 0021-4922 1347-4065 |
language | eng |
recordid | cdi_proquest_miscellaneous_26190359 |
source | IOPscience journals; Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List) |
subjects | Applied sciences Compound structure devices Electronics Exact sciences and technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
title | Reduction of leakage current and minority carrier lifetime in platinum-diffused pn diodes |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T22%3A33%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Reduction%20of%20leakage%20current%20and%20minority%20carrier%20lifetime%20in%20platinum-diffused%20pn%20diodes&rft.jtitle=JPN%20J%20APPL%20PHYS%20PART%201%20REGUL%20PAP%20SHORT%20NOTE%20REV%20PAP&rft.au=SAGALA,%20P&rft.date=1993-09-01&rft.volume=32&rft.issue=9A&rft.spage=3760&rft.epage=3763&rft.pages=3760-3763&rft.issn=0021-4922&rft.eissn=1347-4065&rft.coden=JJAPA5&rft_id=info:doi/10.1143/jjap.32.3760&rft_dat=%3Cproquest_cross%3E26190359%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c388t-23caeccaadbcf177adcdba620bd5bef019f7ff1db5ab4d515ba45bdf41b76973%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=26190359&rft_id=info:pmid/&rfr_iscdi=true |