Microstructure and preferred orientation in pure titanium films deposited by two-facing-target-type DC sputtering

Pure Ti films were produced by two-facing-target-type DC sputtering under various preparation conditions such as sputtering gas pressure, substrate temperature and film thickness, and their microstructures were investigated by both X-ray diffractometry and scanning electron microscopy. The microstru...

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Bibliographic Details
Published in:Thin solid films 1996-08, Vol.281, p.128-131
Main Authors: Miyoshi, Tetsu, Haga, Yumiko, Nittono, Osamu
Format: Article
Language:English
Subjects:
Sputtering
Stress
Titanium
X-ray diffraction
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Summary:Pure Ti films were produced by two-facing-target-type DC sputtering under various preparation conditions such as sputtering gas pressure, substrate temperature and film thickness, and their microstructures were investigated by both X-ray diffractometry and scanning electron microscopy. The microstructures were explained well in terms of structure zone, based on the Thornton's model concerning the morphology in sputtered films. It is also shown that a one-to-one correspondence does not always exist between columnar structure and preferred orientation.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(96)08592-6