Study of a chemical cleaning of InP(100) substrates by infrared absorption and nuclear reaction analysis

• Published in: Applied surface science 1993-03, Vol.64 (3), p.225-230
• Main Authors: Barrière, A.S., Desbat, B., Mombelli, B., Tournay, V.
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Mechanical and acoustical properties; adhesion; Physics; Solid surfaces and solid-solid interfaces; Solid-fluid interfaces; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/0169-4332(93)90028-A

A standard chemical cleaning of InP(100), which allows a thermal desorption of oxidized surface phases under vacuum at relatively low annealing temperature (350°C), has been studied by infrared absorption (IR) spectroscopy and nuclear reaction analysis (NRA). It consists, after a degreasing and chemical etching of the substrate using a H 2SO 4/H 2O 2/H 2O (2:1:1) mixture, in a de-oxidation of the surface by a HF-ethanol (10%) solution, performed on a spinner operated in a nitrogen box. At different stages of the process IR measurements allowed a description of the different atomic groups present at the surface of InP. Traces of oxygen have been evidenced from NRA studies.