Nanofabrication by FIB

Recent advanced FIB systems enable one to define patterns with a dimension around 10 nm, which is required for quantum devices operating near room temperature and is of increasing importance for nanofabrication tools. Various nanofabrication techniques using focused ion beams have been investigated...

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Bibliographic Details
Published in:Microelectronic engineering 1996, Vol.32 (1), p.159-171
Main Author: Gamo, Kenji
Format: Article
Language:English
Subjects:
FIB systems
Nanofabrication
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Summary:Recent advanced FIB systems enable one to define patterns with a dimension around 10 nm, which is required for quantum devices operating near room temperature and is of increasing importance for nanofabrication tools. Various nanofabrication techniques using focused ion beams have been investigated including lithography, maskless ion implantation and in situ fabrication. For direct nanofabrication by FIB, generation of damage may be a problem for some applications, but previous investigations suggest that this can be minimized by using proper processing techniques.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(96)00003-2