Influence of deposition rates and thickness on the electrical resistivity and thermoelectric power of thin iron films

The electrical resistance and the thermopower of thin iron films were measured near room temperature as a function of deposition rate and thickness. The films were deposited on glass plates in a high vacuum system at pressures in the region of 10 -7 Torr. Deviations of the resistivity and the Seebec...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 1994-11, Vol.251 (2), p.99-102
Main Authors: Schepis, Randy S., Matienzo, L.J., Emmi, F., Unertl, William, Schröder, Klaus
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Deposition process
Electrical properties and measurements
Exact sciences and technology
Iron
Physics
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The electrical resistance and the thermopower of thin iron films were measured near room temperature as a function of deposition rate and thickness. The films were deposited on glass plates in a high vacuum system at pressures in the region of 10 -7 Torr. Deviations of the resistivity and the Seebeck coefficient from bulk values increased with decreasing deposition rates.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(94)90671-8