MgO by Injection CVD

• Published in: Thin solid films 1997-12, Vol.311 (1), p.251-258
• Main Authors: Abrutis, A, Kubilius, V, Teišerskis, A, Bigelyt≐, V, Galindo, V, Weiss, F, Sénateur, J.P, Vengalis, B, Jukna, A, Butkut≐, R
• Format: Article
• Language: English
• Subjects: Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Epitaxy; Exact sciences and technology; High-tc films; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Monolayers; Organometallic vapour deposition; Physics; Superconducting films and low-dimensional structures; Superconductivity
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/S0040-6090(97)00456-2

Epitaxial YBa 2Cu 3O 7 layers with 45° in-plane orientation have been grown by Injection CVD on MgO substrates polished off-axis to within 1.4–1.9° of the [100] direction. This new single-source CVD process is based on computer-controlled injection of precise microdoses of a metal–organic precursor solution into a CVD reactor. A wide range of solution compositions was tested to investigate compositional effects on phase purity, surface morphology, texturing and superconducting properties of the prepared films. The highest quality films with pure 45° texture had a smooth surface, zero resistance T c ( R=0) of 88–89 K, and critical current density J c (77 K) above 10 6 A/cm 2.