Phase formation in titanium after high-fluence oxygen ion implantation

Oxygen ions were implanted with an energy of 180 keV and doses between 1·10 17 O +/cm 2 and 15·10 17 O +/cm 2 into titanium at temperatures lower than −20°C. The chemical composition was investigated using Rutherford Backscattering Spectrometry and Elastic Recoil Detection Analysis and the concentra...

Full description

Saved in:
Bibliographic Details
Published in:Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 1999-01, Vol.148 (1), p.851-857
Main Authors: Hammerl, C, Renner, B, Rauschenbach, B, Assmann, W
Format: Article
Language:English
Subjects:
Concentration distribution
Ion implantation
Phase formation
Titanium oxides
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Oxygen ions were implanted with an energy of 180 keV and doses between 1·10 17 O +/cm 2 and 15·10 17 O +/cm 2 into titanium at temperatures lower than −20°C. The chemical composition was investigated using Rutherford Backscattering Spectrometry and Elastic Recoil Detection Analysis and the concentration profiles were calculated by using TRIDYN computer simulations. The oxygen distribution reveals a Gaussian-like shape which confirms the absence of diffusion at temperatures lower than −20°C. The study of phase formation as a function of the implantation dose and the morphology was studied by synchrotron X-ray diffraction and cross section transmission electron microscopy, respectively. The existence of α -and β -TiO, Rutile TiO 2, δ-TiO, and Anosovite Ti 3O 5 after implantation was demonstrated and is discussed in connection with lattice invariant deformations and simple lattice transformations.
ISSN:0168-583X
1872-9584
DOI:10.1016/S0168-583X(98)00660-0