Modelling of Verneuil process for the sapphire crystal growth

The finite element software FIDAP was used to simulate the Verneuil crystal growth process. The turbulent combustion between hydrogen and oxygen, giving water, the hydrodynamics of the gas phase, the inlet and outlet chemical species flow resulting from the combustion and the heat transfer in the fu...

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Published in:Journal of crystal growth 1998-07, Vol.198-199 (1), p.239-245
Main Authors: Santailler, J L, Barvinschi, F.,-, Duffar, T, Le Gal, H
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creator Santailler, J L
Barvinschi, F.,-
Duffar, T
Le Gal, H
description The finite element software FIDAP was used to simulate the Verneuil crystal growth process. The turbulent combustion between hydrogen and oxygen, giving water, the hydrodynamics of the gas phase, the inlet and outlet chemical species flow resulting from the combustion and the heat transfer in the furnace (including internal wall-to-wall radiation) are taken into account. A problem with 10 degrees of freedom per node is generated, solved and the results of the axisymmetric model have shown that the coupling of all these phenomena can be achieved in one numerical model. The effects of transparency of the crystal is discussed. A qualitative agreement between some experimental observations and the model is found, so that modelling may be a good tool for studying the Verneuil process. Nevertheless, some improvements of the model in conjunction with other experimental validations appear necessary.
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title Modelling of Verneuil process for the sapphire crystal growth
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