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Deactivation of thermally formed Ru/Ti oxide electrodes : An AC impedance characterization study

A comparison of the data for the fresh and the deactivated anodes suggests that the deactivated anodes have similar electrochemical characteristics as freshly formed, low-Ru-content (about 5 at%) oxide films. The experimentally obtained ac impedance data were compared to the calculated impedance, ba...

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Published in:Journal of the Electrochemical Society 2001, Vol.148 (9), p.D112-D120
Main Authors: TILAK, B. V, BIRSS, V. I, WANG, J, CHEN, C.-P, RANGARAJAN, S. K
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cited_by cdi_FETCH-LOGICAL-c287t-edec9ce747f66586c333bc75583c5330faaa800fcbaa2838a49113fbd210bc8e3
cites cdi_FETCH-LOGICAL-c287t-edec9ce747f66586c333bc75583c5330faaa800fcbaa2838a49113fbd210bc8e3
container_end_page D120
container_issue 9
container_start_page D112
container_title Journal of the Electrochemical Society
container_volume 148
creator TILAK, B. V
BIRSS, V. I
WANG, J
CHEN, C.-P
RANGARAJAN, S. K
description A comparison of the data for the fresh and the deactivated anodes suggests that the deactivated anodes have similar electrochemical characteristics as freshly formed, low-Ru-content (about 5 at%) oxide films. The experimentally obtained ac impedance data were compared to the calculated impedance, based on a porous film model in which a one-electron surface redox reaction occurs. While the fit is good at medium-to-high frequencies, the inclusion of a diffusion-controlled process for the low at% Ru films is required to achieve a good fit also at low frequencies. These results support the hypothesis that the deactivation of originally high at% Ru anodes is due to the depletion of Ru from the oxide film, causing its electrochemical behaviour to become more similar to that of freshly formed low at% Ru oxide films. 45 refs.
doi_str_mv 10.1149/1.1388630
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_26679816</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>26679816</sourcerecordid><originalsourceid>FETCH-LOGICAL-c287t-edec9ce747f66586c333bc75583c5330faaa800fcbaa2838a49113fbd210bc8e3</originalsourceid><addsrcrecordid>eNpFkF1LwzAUhoMoOKcX_oNciOBFt5ymTVLvxvyEgSDzuqbpCYu0zUxacf56Kxt49XLgOQ-8LyGXwGYAWTGHGXClBGdHZAJFlicSAI7JhDHgSSZyOCVnMX6MJ6hMTsj7HWrTuy_dO99Rb2m_wdDqptlR60OLNX0d5mtH_berkWKDpg--xkhv6aKjiyV17RZr3RmkZqPD6MLgfva22A_17pycWN1EvDjklLw93K-XT8nq5fF5uVglJlWyT7BGUxiUmbRC5EoYznllZJ4rbnLOmdVaK8asqbROFVc6KwC4reoUWGUU8im53nu3wX8OGPuyddFg0-gO_RDLVAhZKBAjeLMHTfAxBrTlNrhWh10JrPzbsITysOHIXh2kOhrd2DAWdfH_AVLIUsl_AT3VcMs</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>26679816</pqid></control><display><type>article</type><title>Deactivation of thermally formed Ru/Ti oxide electrodes : An AC impedance characterization study</title><source>Institute of Physics</source><creator>TILAK, B. V ; BIRSS, V. I ; WANG, J ; CHEN, C.-P ; RANGARAJAN, S. K</creator><contributor>WCA</contributor><creatorcontrib>TILAK, B. V ; BIRSS, V. I ; WANG, J ; CHEN, C.-P ; RANGARAJAN, S. K ; WCA</creatorcontrib><description>A comparison of the data for the fresh and the deactivated anodes suggests that the deactivated anodes have similar electrochemical characteristics as freshly formed, low-Ru-content (about 5 at%) oxide films. The experimentally obtained ac impedance data were compared to the calculated impedance, based on a porous film model in which a one-electron surface redox reaction occurs. While the fit is good at medium-to-high frequencies, the inclusion of a diffusion-controlled process for the low at% Ru films is required to achieve a good fit also at low frequencies. These results support the hypothesis that the deactivation of originally high at% Ru anodes is due to the depletion of Ru from the oxide film, causing its electrochemical behaviour to become more similar to that of freshly formed low at% Ru oxide films. 45 refs.</description><identifier>ISSN: 0013-4651</identifier><identifier>EISSN: 1945-7111</identifier><identifier>DOI: 10.1149/1.1388630</identifier><identifier>CODEN: JESOAN</identifier><language>eng</language><publisher>Pennington, NJ: Electrochemical Society</publisher><subject>Chemistry ; Electrochemistry ; Electrodes: preparations and properties ; Exact sciences and technology ; General and physical chemistry ; Other electrodes</subject><ispartof>Journal of the Electrochemical Society, 2001, Vol.148 (9), p.D112-D120</ispartof><rights>2001 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c287t-edec9ce747f66586c333bc75583c5330faaa800fcbaa2838a49113fbd210bc8e3</citedby><cites>FETCH-LOGICAL-c287t-edec9ce747f66586c333bc75583c5330faaa800fcbaa2838a49113fbd210bc8e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,4024,27923,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=1121427$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><contributor>WCA</contributor><creatorcontrib>TILAK, B. V</creatorcontrib><creatorcontrib>BIRSS, V. I</creatorcontrib><creatorcontrib>WANG, J</creatorcontrib><creatorcontrib>CHEN, C.-P</creatorcontrib><creatorcontrib>RANGARAJAN, S. K</creatorcontrib><title>Deactivation of thermally formed Ru/Ti oxide electrodes : An AC impedance characterization study</title><title>Journal of the Electrochemical Society</title><description>A comparison of the data for the fresh and the deactivated anodes suggests that the deactivated anodes have similar electrochemical characteristics as freshly formed, low-Ru-content (about 5 at%) oxide films. The experimentally obtained ac impedance data were compared to the calculated impedance, based on a porous film model in which a one-electron surface redox reaction occurs. While the fit is good at medium-to-high frequencies, the inclusion of a diffusion-controlled process for the low at% Ru films is required to achieve a good fit also at low frequencies. These results support the hypothesis that the deactivation of originally high at% Ru anodes is due to the depletion of Ru from the oxide film, causing its electrochemical behaviour to become more similar to that of freshly formed low at% Ru oxide films. 45 refs.</description><subject>Chemistry</subject><subject>Electrochemistry</subject><subject>Electrodes: preparations and properties</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Other electrodes</subject><issn>0013-4651</issn><issn>1945-7111</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNpFkF1LwzAUhoMoOKcX_oNciOBFt5ymTVLvxvyEgSDzuqbpCYu0zUxacf56Kxt49XLgOQ-8LyGXwGYAWTGHGXClBGdHZAJFlicSAI7JhDHgSSZyOCVnMX6MJ6hMTsj7HWrTuy_dO99Rb2m_wdDqptlR60OLNX0d5mtH_berkWKDpg--xkhv6aKjiyV17RZr3RmkZqPD6MLgfva22A_17pycWN1EvDjklLw93K-XT8nq5fF5uVglJlWyT7BGUxiUmbRC5EoYznllZJ4rbnLOmdVaK8asqbROFVc6KwC4reoUWGUU8im53nu3wX8OGPuyddFg0-gO_RDLVAhZKBAjeLMHTfAxBrTlNrhWh10JrPzbsITysOHIXh2kOhrd2DAWdfH_AVLIUsl_AT3VcMs</recordid><startdate>2001</startdate><enddate>2001</enddate><creator>TILAK, B. V</creator><creator>BIRSS, V. I</creator><creator>WANG, J</creator><creator>CHEN, C.-P</creator><creator>RANGARAJAN, S. K</creator><general>Electrochemical Society</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>2001</creationdate><title>Deactivation of thermally formed Ru/Ti oxide electrodes : An AC impedance characterization study</title><author>TILAK, B. V ; BIRSS, V. I ; WANG, J ; CHEN, C.-P ; RANGARAJAN, S. K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c287t-edec9ce747f66586c333bc75583c5330faaa800fcbaa2838a49113fbd210bc8e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Chemistry</topic><topic>Electrochemistry</topic><topic>Electrodes: preparations and properties</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Other electrodes</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>TILAK, B. V</creatorcontrib><creatorcontrib>BIRSS, V. I</creatorcontrib><creatorcontrib>WANG, J</creatorcontrib><creatorcontrib>CHEN, C.-P</creatorcontrib><creatorcontrib>RANGARAJAN, S. K</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>TILAK, B. V</au><au>BIRSS, V. I</au><au>WANG, J</au><au>CHEN, C.-P</au><au>RANGARAJAN, S. K</au><au>WCA</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deactivation of thermally formed Ru/Ti oxide electrodes : An AC impedance characterization study</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>2001</date><risdate>2001</risdate><volume>148</volume><issue>9</issue><spage>D112</spage><epage>D120</epage><pages>D112-D120</pages><issn>0013-4651</issn><eissn>1945-7111</eissn><coden>JESOAN</coden><abstract>A comparison of the data for the fresh and the deactivated anodes suggests that the deactivated anodes have similar electrochemical characteristics as freshly formed, low-Ru-content (about 5 at%) oxide films. The experimentally obtained ac impedance data were compared to the calculated impedance, based on a porous film model in which a one-electron surface redox reaction occurs. While the fit is good at medium-to-high frequencies, the inclusion of a diffusion-controlled process for the low at% Ru films is required to achieve a good fit also at low frequencies. These results support the hypothesis that the deactivation of originally high at% Ru anodes is due to the depletion of Ru from the oxide film, causing its electrochemical behaviour to become more similar to that of freshly formed low at% Ru oxide films. 45 refs.</abstract><cop>Pennington, NJ</cop><pub>Electrochemical Society</pub><doi>10.1149/1.1388630</doi></addata></record>
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language eng
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subjects Chemistry
Electrochemistry
Electrodes: preparations and properties
Exact sciences and technology
General and physical chemistry
Other electrodes
title Deactivation of thermally formed Ru/Ti oxide electrodes : An AC impedance characterization study
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T18%3A43%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Deactivation%20of%20thermally%20formed%20Ru/Ti%20oxide%20electrodes%20:%20An%20AC%20impedance%20characterization%20study&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=TILAK,%20B.%20V&rft.date=2001&rft.volume=148&rft.issue=9&rft.spage=D112&rft.epage=D120&rft.pages=D112-D120&rft.issn=0013-4651&rft.eissn=1945-7111&rft.coden=JESOAN&rft_id=info:doi/10.1149/1.1388630&rft_dat=%3Cproquest_cross%3E26679816%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c287t-edec9ce747f66586c333bc75583c5330faaa800fcbaa2838a49113fbd210bc8e3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=26679816&rft_id=info:pmid/&rfr_iscdi=true