Interaction of two-phase plasma flux of vacuum arc discharge with a surface

The surface interaction of a vacuum arc generated two-phase, multicomponent plasma flux containing microdrops along with multicharged ions and neutral atoms is analyzed. Analytical expressions relating the ion current, the coating deposition rate and the heat flux on to the surface to the substrate...

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Bibliographic Details
Published in:Surface & coatings technology 1998-06, Vol.105 (1), p.25-30
Main Author: Mouboiadjian, S.A
Format: Article
Language:English
Subjects:
Ion plating
Plasma flux
Plasma–substrate interaction
Vacuum arc discharge
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Summary:The surface interaction of a vacuum arc generated two-phase, multicomponent plasma flux containing microdrops along with multicharged ions and neutral atoms is analyzed. Analytical expressions relating the ion current, the coating deposition rate and the heat flux on to the surface to the substrate bias voltage are derived. The conditions of a transition from the coating deposition to ion sputtering of the surface are obtained. For a plasma flux generated by a Hall plasma accelerator with a “cold” evaporated cathode, the values of the interaction energy “voltequivalents” ( U**) between the two-phase plasma flux of pure metals (Ti, Al, Cr), a multicomponent alloy (NiCrAlY) and the surfaces are determined using an original probe technique. The self-sputtering yields of an NiCrAlY alloy and Ni, Cr, Al in accordance with the substrate voltage are also measured. It is shown that U** values for Ti, Al, Cr and an NiCrAlY alloy are equal to 100, 92, 133 and 100 V, respectively.
ISSN:0257-8972
1879-3347
DOI:10.1016/S0257-8972(97)00559-8