Polishing of polycrystalline diamond by hot nickel surface

A microwave plasma technique has been employed to deposit polycrystalline diamond film over a molybdenum substrate button using a gas mixture of hydrogen and methane at a substrate temperature of 851°C. A CVD diamond coated molybdenum substrate button was mounted with a load against hot nickel plate...

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Bibliographic Details
Published in:Thin solid films 1998-05, Vol.320 (2), p.223-227
Main Authors: Ramesham, R., Rose, M.F.
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Hot nickel
Hot tungsten filament
Materials science
Microwave plasma CVD
Physics
Polishing
Polishing diamond
Polycrystalline diamond film
Surface treatments
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Summary:A microwave plasma technique has been employed to deposit polycrystalline diamond film over a molybdenum substrate button using a gas mixture of hydrogen and methane at a substrate temperature of 851°C. A CVD diamond coated molybdenum substrate button was mounted with a load against hot nickel plate and rotated for 3.45 h in a hydrogen ambient. Hot tungsten filament was used as a heat source to maintain the temperature of the nickel block and CVD diamond coated molybdenum button at 848°C. This experiment has reproducibly shown the successful polishing of polycrystalline CVD diamond by hot nickel. A Tencor profilometer and scanning electron microscope have been used to evaluate the surface smoothness and morphology before and after polishing the polycrystalline diamond thin films.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(97)00944-9