Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3-x and Al(CyH2y+1)3 Precursors

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Bibliographic Details
Published in:Journal of the American Chemical Society 2022-07, Vol.144 (26), p.11757-11766
Main Authors: Oh, Il-Kwon, Sandoval, Tania E, Liu, Tzu-Ling, Richey, Nathaniel E, Nguyen, Chi Thang, Gu, Bonwook, Lee, Han-Bo-Ram, Tonner-Zech, Ralf, Bent, Stacey F
Format: Article
Language:English
Online Access:Get full text
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ISSN:1520-5126
DOI:10.1021/jacs.2c03752