Growth of amorphous carbon films by carbon atom bombardment in the energy range 10–500 eV

Molecular dynamics (MD) simulations were carried out of the energetic impact of C atoms on amorphous carbon (a-C) substrates in the energy range 10–500 eV. The results show that a densification of the deposited material occurs up to 150 eV energy but with a low sp 3 bond content. At 500 eV impact th...

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Published in:Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 2001-06, Vol.180 (1), p.145-152
Main Authors: Yastrebov, Sergey, Smith, Roger
Format: Article
Language:English
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Summary:Molecular dynamics (MD) simulations were carried out of the energetic impact of C atoms on amorphous carbon (a-C) substrates in the energy range 10–500 eV. The results show that a densification of the deposited material occurs up to 150 eV energy but with a low sp 3 bond content. At 500 eV impact the substrate material shows a significant decrease in density and a porous a-C structure forms.
ISSN:0168-583X
1872-9584
DOI:10.1016/S0168-583X(01)00409-8