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Electron Cyclotron Resonance Plasma Etching of n-SiC and Evaluation of Ni/n-SiC Contacts by Current Noise Measurements
The Si surface of n-SiC is etched by an Ar electron cyclotron resonance plasma in order to smooth the as-received substrates. Low-frequency current noise characteristics of Ohmic contacts of the wide-band-gap semiconductor n-SiC are investigated. Ohmic contacts with a diameter of 200 µm have a minim...
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Published in: | Japanese Journal of Applied Physics 2001, Vol.40 (6R), p.3979-3984 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The Si surface of n-SiC is etched by an Ar electron cyclotron resonance plasma in order to smooth the as-received substrates. Low-frequency current noise characteristics of Ohmic contacts of the wide-band-gap semiconductor n-SiC are investigated. Ohmic contacts with a diameter of 200 µm have a minimum Ohmic contact resistance of the order of 10
-4
Ω·cm
2
at an alloying temperature of 1000°C for 30 min. These low resistance Ohmic contacts show typical 1/
f
current noise characteristics that increase with the square of the sample current
I
2
. A sample with a higher contact resistance exhibits, however, current noise power increase with increasing sample current
I
. The relevant total electron number between the electrodes of the bulk substrate is estimated from the resistance and by finite element method simulation, from which the Hooge parameter α
H
is estimated to be approximately 40. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.40.3979 |