Heavy-ion-induced breakdown in ultra-thin gate oxides and high-k dielectrics

Presents experimental results on single-event-induced breakdown in sub-5-nm plasma-enhanced SiO/sub 2/, nitrided SiO/sub 2/, Al/sub 2/O/sub 3/, HfO/sub 2/, and Zr/sub 0.4/Si/sub 1.6/O/sub 4/ dielectrics typical of current and future-generation commercial gate oxides. These advanced oxides are found...

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Bibliographic Details
Published in:IEEE transactions on nuclear science 2001-12, Vol.48 (6), p.1904-1912
Main Authors: Massengill, L.W., Choi, B.K., Fleetwood, D.M., Schrimpf, R.D., Galloway, K.F., Shaneyfelt, M.R., Meisenheimer, T.L., Dodd, P.E., Schwank, J.R., Lee, Y.M., Johnson, R.S., Lucovsky, G.
Format: Article
Language:English
Subjects:
Breakdown
Breakdown voltage
Capacitance
Dielectric breakdown
Dielectrics
Electric breakdown
Electric potential
Gates
Gold
Hafnium oxide
High K dielectric materials
High-K gate dielectrics
Oxides
Plasmas
Silicon dioxide
Voltage
Zirconium
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Summary:Presents experimental results on single-event-induced breakdown in sub-5-nm plasma-enhanced SiO/sub 2/, nitrided SiO/sub 2/, Al/sub 2/O/sub 3/, HfO/sub 2/, and Zr/sub 0.4/Si/sub 1.6/O/sub 4/ dielectrics typical of current and future-generation commercial gate oxides. These advanced oxides are found to be quite resistant to ion-induced breakdown. Radiation-induced soft breakdown was observed in some films with 342 MeV Au (LET=80 MeV/mg/cm/sup 2/) but not 340 MeV I (LET=60 MeV/mg/cm/sup 2/). The critical voltage to hard breakdown was found to scale with the square root of the physical oxide thickness, not with the energy stored on the gate capacitance. Alternative dielectrics with equivalent oxide thickness substantially below their physical thickness were found to exhibit significantly higher voltage to hard breakdown than SiO/sub 2/ counterparts. All of the samples reached ion-induced hard breakdown at applied voltages well above typical operating power-supply voltages; these findings bode well for the use of advanced commercial integrated circuits in space systems.
ISSN:0018-9499
1558-1578
DOI:10.1109/23.983149