Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues

An overview of our recent work on ultrathin (

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Bibliographic Details
Published in:Microelectronic engineering 2001-11, Vol.59 (1), p.341-349
Main Authors: Gusev, E.P, Cartier, E, Buchanan, D.A, Gribelyuk, M, Copel, M, Okorn-Schmidt, H, D’Emic, C
Format: Article
Language:English
Subjects:
Al 2O 3
Applied sciences
Electronics
Exact sciences and technology
HfO 2
High-k gate dielectrics
Interfaces
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
Y 2O 3
ZrO 2
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Description
Summary:An overview of our recent work on ultrathin (
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(01)00667-0