Simulation of the MO film deposition in the magnetron sputtering discharge

The Monte Carlo simulation code ACAT-DIFFUSE-GAS has been developed in order to simulate the whole system of a planar magnetron sputtering discharge. The atomic collisions in the Tb-Fe-Co alloy cathode, which lead to sputtering and reflection, are simulated by the ACAT-DIFFUSE routine which includes...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 1998-12, Vol.334 (1-2), p.225-229
Main Authors: Ishida, Masanobu, Yamaguchi, Yukio, Yamamura, Yasunori
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Exact sciences and technology
Magneto-optical film
Magnetron sputtering deposition
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Monte Carlo simulation
Physics
Ternary alloy sputtering
Theory and models of film growth
Thin-film growth
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The Monte Carlo simulation code ACAT-DIFFUSE-GAS has been developed in order to simulate the whole system of a planar magnetron sputtering discharge. The atomic collisions in the Tb-Fe-Co alloy cathode, which lead to sputtering and reflection, are simulated by the ACAT-DIFFUSE routine which includes the compositional change induced by ion influence. The thermalization of sputtered Tb, Fe and Co atoms and reflected Ar atoms in the background Ar gas within the planar magnetron sputtering discharge are simulated by the GAS routine, using the Monte Carlo technique. It is found that the deposited composition rate of Tb, Fe and Co depends strongly on the background pressure. The appreciable amount of energetic reflected Ar atoms transmit at the low pressure and deposit their energies on the magneto-optical film.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(98)01149-3