Simulation of deposition-topography granular distortion for TCAD

A new deposition simulator for technology computer aided design (TCAD) is presented in this paper. The solution, on a cellular automaton lattice, of the equations that describe the deposition process has enabled the proposed simulator to handle the complicated boundary and initial conditions imposed...

Full description

Saved in:
Bibliographic Details
Published in:Modelling and simulation in materials science and engineering 1998-05, Vol.6 (3), p.199-210
Main Authors: Karafyllidis, I, Georgoulas, N, Hagouel, P I, Thanailakis, A
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A new deposition simulator for technology computer aided design (TCAD) is presented in this paper. The solution, on a cellular automaton lattice, of the equations that describe the deposition process has enabled the proposed simulator to handle the complicated boundary and initial conditions imposed by granular defects. This simulator can provide scanning electron microscope (SEM)-like cross-sectional views that are in very good agreement with experimental and simulation results found in the literature, and it can also be used to perform numerical experiments. The effects of granule temperature, location, and size on the deposition profiles have been studied by performing numerical experiments using this simulator.
ISSN:0965-0393
1361-651X
DOI:10.1088/0965-0393/6/3/001