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Impurities in hydride gases. Part 1 : Investigation of trace moisture in the liquid and vapor phase of ultra-pure ammonia by FTIR spectroscopy
Trace moisture in ammonia is a critical impurity in the growth of epitaxial nitride films. Because moisture is very soluble in the liquid phase of ammonia, moisture in the vapor phase increases dramatically with cylinder use, and is often far higher than the nominal purity specification. A reliable...
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Published in: | Journal of electronic materials 2001-11, Vol.30 (11), p.1438-1447 |
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creator | FUNKE, Hans H RAYNOR, Mark W YÜCELEN, Belgin HOULDING, Virginia H |
description | Trace moisture in ammonia is a critical impurity in the growth of epitaxial nitride films. Because moisture is very soluble in the liquid phase of ammonia, moisture in the vapor phase increases dramatically with cylinder use, and is often far higher than the nominal purity specification. A reliable method was developed for sampling and analyzing trace moisture in both liquid- and vapor-phase ammonia using FTIR. Analysis of liquid-phase ammonia gives a stable and representative moisture value whereas gas-phase moisture levels strongly depend on sampling time, flow rate, temperature, mixing, and extent of cylinder use. The variation of vapor-phase moisture is discussed in terms of a variable vaporization model with applications to high flow. |
doi_str_mv | 10.1007/s11664-001-0199-4 |
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subjects | Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
title | Impurities in hydride gases. Part 1 : Investigation of trace moisture in the liquid and vapor phase of ultra-pure ammonia by FTIR spectroscopy |
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