Influence of microstructure on the chemical diffusion of lithium ions in amorphous lithiated tungsten oxide films

We describe how the chemical diffusion of lithium ions is affected by microstructural changes in amorphous lithiated tungsten oxide (a-Li x WO 3) films as a function of lithium ion concentration. The chemical diffusion of lithium ions in a-Li x WO 3 films is investigated using ac impedance spectrosc...

Full description

Saved in:
Bibliographic Details
Published in:Electrochimica acta 2001-08, Vol.46 (22), p.3415-3419
Main Authors: Lee, Se-Hee, Cheong, Hyeonsik M., Edwin Tracy, C., Mascarenhas, Angelo, Pitts, Roland, Jorgensen, Gary, Deb, Satyen K.
Format: Article
Language:English
Subjects:
ac Impedance
Chemical diffusion
Chemistry
Electrochemistry
Electrodes: preparations and properties
Exact sciences and technology
General and physical chemistry
Lithium insertion
Other electrodes
Raman
Tungsten oxide
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We describe how the chemical diffusion of lithium ions is affected by microstructural changes in amorphous lithiated tungsten oxide (a-Li x WO 3) films as a function of lithium ion concentration. The chemical diffusion of lithium ions in a-Li x WO 3 films is investigated using ac impedance spectroscopy and Raman scattering measurements. Two different a-WO 3 films deposited by thermal evaporation at different partial pressures of nitrogen are used for these measurements. Based on the results of ac impedance spectroscopy and Raman scattering measurements, we conclude that the mechanism of these diffusion phenomena is attributed to an increase or decrease of the W 6+O/OW 6+O ratio with lithium ion insertion.
ISSN:0013-4686
1873-3859
DOI:10.1016/S0013-4686(01)00541-2