Proposal for new atomic force microscopy (AFM) imaging for a high aspect structure (digital probing mode AFM)

• Published in: Microelectronic engineering 2001-09, Vol.57, p.651-657
• Main Authors: Hosaka, Sumio, Morimoto, Takafumi, Kuroda, Kouji, Kunitomo, Hiroyuki, Hiroki, Takenori, Kitsukawa, Tsuyoshi, Miwa, Shigeru, Yanagimoto, Hiroyuki, Murayama, Ken
• Format: Article
• Language: English
• Subjects: 3D imaging; Applied sciences; Atomic force microscopes; Atomic force microscopy (AFM); CMP; Design. Technologies. Operation analysis. Testing; Digital probing mode AFM; Electronics; Exact sciences and technology; High aspect structures; In-line monitor; Instruments, apparatus, components and techniques common to several branches of physics and astronomy; Integrated circuits; LSI process monitor; Physics; Scanning probe microscopes, components and techniques; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/S0167-9317(01)00551-2

A new imaging technique of digital probing method in atomic force microscopy (AFM) is proposed for the evaluation of high aspect structures. This method independently controls the probe in either xy- or z-directional movement to remove torsion of the probe. The xy-movement only takes place when the probe is separated from the sample surface. During the approach of the probe to the surface the xy-movement is stopped. This method allows to image the dry-etched grooves faithfully. Compared with cross-section SEM observation with cracking of the sample, it is demonstrated that this method is advantageous for the evaluation of the cross-section because of the short measurement time and easy operation.