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Deposition of PZT thin film and determination of their optical properties

The RF magnetron sputtering technique was applied for the thin film deposition. Hot-pressed PZT ceramics doped mainly with Bi and Ge were used as a target. The PZT thin films were grown on different substrates (Si, stainless steel and glass) and the sputtering parameters were optimised to assure the...

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Bibliographic Details
Published in:Journal of the European Ceramic Society 1999-01, Vol.19 (6), p.1489-1492
Main Authors: Czekaj, D, Gomes, M.J.M, Vasilevskiy, M, Pereira, M, Dos Santos, M.P
Format: Article
Language:English
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Summary:The RF magnetron sputtering technique was applied for the thin film deposition. Hot-pressed PZT ceramics doped mainly with Bi and Ge were used as a target. The PZT thin films were grown on different substrates (Si, stainless steel and glass) and the sputtering parameters were optimised to assure the composition transfer between the target and the thin film. The obtained samples were analysed first as made and then after post deposition annealing. Structure of the films was investigated by X-ray diffraction. Optical properties of the thin films were investigated by: (i) linear absorption method and (ii) Raman scattering. Results of the modelling of the optical spectra for the PZT films on glass substrates are also reported.
ISSN:0955-2219
1873-619X
DOI:10.1016/S0955-2219(98)00461-0