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Deposition of PZT thin film and determination of their optical properties
The RF magnetron sputtering technique was applied for the thin film deposition. Hot-pressed PZT ceramics doped mainly with Bi and Ge were used as a target. The PZT thin films were grown on different substrates (Si, stainless steel and glass) and the sputtering parameters were optimised to assure the...
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Published in: | Journal of the European Ceramic Society 1999-01, Vol.19 (6), p.1489-1492 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The RF magnetron sputtering technique was applied for the thin film deposition. Hot-pressed PZT ceramics doped mainly with Bi and Ge were used as a target. The PZT thin films were grown on different substrates (Si, stainless steel and glass) and the sputtering parameters were optimised to assure the composition transfer between the target and the thin film. The obtained samples were analysed first as made and then after post deposition annealing. Structure of the films was investigated by X-ray diffraction. Optical properties of the thin films were investigated by: (i) linear absorption method and (ii) Raman scattering. Results of the modelling of the optical spectra for the PZT films on glass substrates are also reported. |
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ISSN: | 0955-2219 1873-619X |
DOI: | 10.1016/S0955-2219(98)00461-0 |