Relationship between hardness and lattice parameter for TiN films deposited on SUS 304 by an IBAD technique

Titanium nitride films were deposited on SUS 304 stainless steel using an ion beam-assisted deposition technique. The N ions were accelerated at energy of 0.5-2.0 keV with an intensity of 0.1 mA /cm exp 2 on the substrate. Substrates were held at temperatures of 400-770 deg C during deposition. For...

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Bibliographic Details
Published in:Surface & coatings technology 2001-09, Vol.158-159, p.690-693
Main Authors: Yokota, K, Nakamura, K, Kasuya, T, Tamura, S, Sugimoto, T, Akamatsu, K, Nakao, K, Miyashita, F
Format: Article
Language:English
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Summary:Titanium nitride films were deposited on SUS 304 stainless steel using an ion beam-assisted deposition technique. The N ions were accelerated at energy of 0.5-2.0 keV with an intensity of 0.1 mA /cm exp 2 on the substrate. Substrates were held at temperatures of 400-770 deg C during deposition. For the TiN films, hardness was in the range from 350 to 550 GPa, depending on the N ion-beam energy, while the lattice parameter was dependent on the N ion-beam energy and substrate temperature. The lattice parameter dependence of hardness for the TiN films deposited at temperatures lower than 600 deg C differed from that for films deposited at temperatures above 700 deg C.
ISSN:0257-8972