Optical, structural and electrical properties of tin oxide films prepared by magnetron sputtering

Films with thickness of 150-450 nm were deposited at a rate of 0.5 A/s in an argon-oxygen atmosphere on polycrystalline corundum, quartz and glass slides. The films were annealed in air at temperature 550 deg C for 0.5, 1, 2, 4 and 8 h to stabilize their parameters. A correlation between the electri...

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Bibliographic Details
Published in:Surface & coatings technology 2001-06, Vol.151-152, p.76-81
Main Authors: Karapatnitski, I A, Mit, K A, Mukhamedshina, D M, Beisenkhanov, N B
Format: Article
Language:English
Online Access:Get full text
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Summary:Films with thickness of 150-450 nm were deposited at a rate of 0.5 A/s in an argon-oxygen atmosphere on polycrystalline corundum, quartz and glass slides. The films were annealed in air at temperature 550 deg C for 0.5, 1, 2, 4 and 8 h to stabilize their parameters. A correlation between the electrical resistivity and optical and structural properties of the films was found. Transparent films for wavelengths in the range 200-1200 nm as well as gas-sensitive films for sensors were obtained.
ISSN:0257-8972