CVD diamond films: nucleation and growth

In the last decade, we have seen rapid developments in metastable diamond synthesis by means of low-pressure chemical vapor deposition. Concurrently, a fast growing interest in diamond technology has emerged. This review discusses the various low-pressure growth methods of diamond films. Particular...

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Bibliographic Details
Published in:Materials science & engineering. R, Reports : a review journal Reports : a review journal, 1999-07, Vol.25 (4), p.123-154
Main Authors: Lee, S.-Tong, Lin, Zhangda, Jiang, Xin
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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Summary:In the last decade, we have seen rapid developments in metastable diamond synthesis by means of low-pressure chemical vapor deposition. Concurrently, a fast growing interest in diamond technology has emerged. This review discusses the various low-pressure growth methods of diamond films. Particular attention is paid to recent advances in the understanding of the mechanism of diamond nucleation and metastable growth. These advances are discussed in connection with the advances in diamond heteroepitaxy, which raises hopes that single crystalline diamond films are not far beyond reach. Modern surface science techniques applied to diamond study have played an essential role in these achievements and their contributions are discussed.
ISSN:0927-796X
1879-212X
DOI:10.1016/S0927-796X(99)00003-0