Growth of magnesium oxide thin films using single molecular precursors by metal–organic chemical vapor deposition

• Published in: Thin solid films 1999-03, Vol.341 (1), p.63-67
• Main Authors: Boo, Jin-Hyo, Lee, Soon-Bo, Yu, Kyu-Sang, Koh, Wonyong, Kim, Yunsoo
• Format: Article
• Language: English
• Subjects: Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; MgO; MOCVD; Physics; Sapphire; Silicon; Single molecular precursors
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/S0040-6090(98)01524-7

Thin films of MgO have been deposited on Si(100) and c-plane sapphire substrates by the metal–organic chemical vapor deposition (MOCVD) method using Mg(tmhd) 2 and Mg(acac) 2 as single molecular precursors and oxygen as carrier gas. We have synthesized the metal–organic precursors used in this study. Strongly [111] oriented polycrystalline MgO films were obtained on both Si(100) and c-plane sapphire substrates using these precursors in the temperature range 500–600°C. The MgO thin films grown on Si(100) at 600°C and on c-plane sapphire at 500°C with Mg(tmhd) 2 are highly oriented in the [111] direction, whereas the MgO film grown on Si(100) at 350°C and then annealed at 520°C has no preferred orientation. In the case of using Mg(acac) 2 as precursor, however, the MgO film deposited on c-plane sapphire surface at a deposition temperature above 500°C was grown with more [110] and [100] dominant orientation relatively rather than [111]. Furthermore, we have also shown that the synthesized precursors Mg(tmhd) 2 and Mg(acac) 2 are suitable precursors for obtaining MgO thin films by MOCVD and the substrate or precursor type and the growth temperature will be important factors influencing either the crystal growth direction or the crystallinity of the films.