Thin film synthesis by energetic condensation

▪ Abstract  The use of energetic particles (ions and atoms) has become increasingly important in physical vapor deposition techniques. These deposition processes can be divided in two main classes: ion beam-assisted deposition and energetic condensation (or deposition). This review focuses on the la...

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Bibliographic Details
Published in:Annual review of materials research 2001-01, Vol.31 (1), p.111-137
Main Author: MONTEIRO, Othon R
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Ion and electron beam-assisted deposition
ion plating
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Thin films
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Summary:▪ Abstract  The use of energetic particles (ions and atoms) has become increasingly important in physical vapor deposition techniques. These deposition processes can be divided in two main classes: ion beam-assisted deposition and energetic condensation (or deposition). This review focuses on the latter, i.e. processes in which the actual depositing species have energies that far exceed ordinary thermal energies, namely energies greater than 20 eV. The phenomenology of the effect of these high-energy particles on the growth of thin films is first broadly presented, and then specific examples of film deposition are given. The examples drawn here are of films that have been prepared by metal plasma immersion implantation and deposition. The observed microstructures and functional properties of these films are discussed in terms of processing conditions.
ISSN:0084-6600
1531-7331
2375-0308
1545-4118
DOI:10.1146/annurev.matsci.31.1.111