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NO sub(2) sensor based on InP epitaxial thin layers
n-InP epitaxial thin layers are exposed to concentrations of a diluted oxidizing gas: NO sub(2). In the presence of this gas, the resistance measured parallel to the surface of the InP layer, between ohmic contacts, increases. The magnitude of its variations depends on several parameters: the operat...
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Published in: | Thin solid films 1999-01, Vol.348 (1), p.266-272 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Online Access: | Get full text |
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Summary: | n-InP epitaxial thin layers are exposed to concentrations of a diluted oxidizing gas: NO sub(2). In the presence of this gas, the resistance measured parallel to the surface of the InP layer, between ohmic contacts, increases. The magnitude of its variations depends on several parameters: the operating temperature, the thickness and the doping concentration level of the InP layer, and the gas concentration. A theoretical model of the action of the gas is proposed, mixing chemisorption equilibrium and surface field effect. The experimental results are in agreement with the theoretical predictions. |
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ISSN: | 0040-6090 |