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The rapid growth of thin transparent films of diamond

Thin transparent films of diamond have been grown only by chemical vapor deposition (CVD) methods at slow rates. Using a hot filament CVD reactor of large area ( 30 cm×40 cm ), these films were deposited onto highly polished copper substrate at a rate of about 1 μm h −1. The cost of manufacturing th...

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Bibliographic Details
Published in:Materials chemistry and physics 2001-11, Vol.72 (2), p.130-132
Main Authors: Chung, Hsiao-Kuo, Sung, James C.
Format: Article
Language:English
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Summary:Thin transparent films of diamond have been grown only by chemical vapor deposition (CVD) methods at slow rates. Using a hot filament CVD reactor of large area ( 30 cm×40 cm ), these films were deposited onto highly polished copper substrate at a rate of about 1 μm h −1. The cost of manufacturing thin transparent films of 20 μm thickness may be as low as $1 cm −2. At such a low cost, thin transparent films should have diversified applications, such as X-ray windows, high frequency (up to 10 GHz) SAW filters, and other advanced devices.
ISSN:0254-0584
1879-3312
DOI:10.1016/S0254-0584(01)00421-7