Negative tone hybrid sol-gel material for electron-beam lithography

A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 mu...

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Bibliographic Details
Published in:Thin solid films 1999-05, Vol.345 (2), p.185-187
Main Authors: Rantala, J T, Penner, R S, Honkanen, S, Vahakangas, J, Fallahi, M, Peyghambarian, N
Format: Article
Language:English
Online Access:Get full text
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Summary:A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 mu C/cm super(2) were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 mu m.
ISSN:0040-6090
DOI:10.1016/S0040-6090(98)01365-0