Bonding character of the boron-doped C60 films prepared by radio frequency plasma assisted vapor deposition

• Published in: Journal of materials science 2002-03, Vol.37 (5), p.1043-1047
• Main Authors: ZOU, Y. J, ZHANG, X. W, LI, Y. L, WANG, B, YAN, H, CUI, J. Z, LIU, L. M, DA, D. A
• Format: Article
• Language: English
• Subjects: Atomic force microscopy; Boron; Buckminsterfullerene; Chemical bonds; Chemical synthesis; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Defects and impurities: doping, implantation, distribution, concentration, etc; Exact sciences and technology; Fourier transforms; Fullerenes; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Morphology; Organic chemistry; Photoelectrons; Physics; Polymerization; Radio frequency; Radio frequency plasma; Spectrum analysis; Structure and morphology; thickness; Substrates; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; Thin films; Vapor deposition; Vapor phase epitaxy; growth from vapor phase; X ray photoelectron spectroscopy
• ISSN: 0022-2461; 1573-4803
• DOI: 10.1023/A:1014368418784

Boron-doped C60 thin films were synthesized firstly by a radio frequency plasma assisted vapor deposition technique using C60 as a precursor. The surface morphology of the samples was observed by atomic force microscopy, and their chemical bonding characters were investigated by x-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy. The results show that the boron atoms are incorporated into the fullerene molecules in the samples, and the boron heterofullerene C60−nBn was synthesized. Plasma polymerized C60 molecules were also found in the samples besides the boron heterofullerene. The effects of radio frequency power and the substrate position on the growth of the B-doped C60 films were studied. The results indicate that the higher energies and densities of the reactive radicals in the plasma are favorable for the formation of the boron heterofullerene C60−nBn or polymerized C60 molecules.