Porous freestanding diamond membranes with reduced pore diameter

We have shown previously that porous diamond membranes can be fabricated using a method based on growing diamond on a patterned silicon substrate. The technique used to pattern the silicon is conventional lithography. In this work we present a method for reducing the pore size using diamond post-dep...

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Bibliographic Details
Published in:Thin solid films 1999-09, Vol.353 (1), p.239-243
Main Authors: Mammana, V.P., Silva, S., Mansano, R.D., Verdonck, P., Pavani Filho, A., Salvadori, M.C., Brown, I.G.
Format: Article
Language:English
Subjects:
Chemical vapor deposition (CVD)
Chemistry
Colloidal state and disperse state
Diamond
Exact sciences and technology
General and physical chemistry
Membranes
Plasma processing and deposition
Surface morphology
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Summary:We have shown previously that porous diamond membranes can be fabricated using a method based on growing diamond on a patterned silicon substrate. The technique used to pattern the silicon is conventional lithography. In this work we present a method for reducing the pore size using diamond post-deposition over the membrane. An important concern in this work was to determine the pore-shutting rate, considering the time post-deposition and the pore morphology.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(99)00296-5