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Diamond-like carbon films deposited by electron beam excited plasma chemical vapor deposition
An electron beam excited plasma (EBEP) system can produce a high-density plasma by introducing a high-current and low-energy electron beam into a process chamber. Diamond-like carbon (DLC) films prepared by EBEP-CVD systems were investigated for deposition rate, dynamic hardness and microstructure....
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Published in: | Diamond and related materials 2002-07, Vol.11 (7), p.1353-1359 |
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cited_by | cdi_FETCH-LOGICAL-c368t-ae2840a6724871d3ef6af6e7da420b69b13ac5689c4909f2aa924a9c271d46be3 |
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cites | cdi_FETCH-LOGICAL-c368t-ae2840a6724871d3ef6af6e7da420b69b13ac5689c4909f2aa924a9c271d46be3 |
container_end_page | 1359 |
container_issue | 7 |
container_start_page | 1353 |
container_title | Diamond and related materials |
container_volume | 11 |
creator | Ban, Masahito Ryoji, Makoto Hasegawa, Takeshi Mori, Yukitaka Fujii, Sadao Fujioka, Junzo |
description | An electron beam excited plasma (EBEP) system can produce a high-density plasma by introducing a high-current and low-energy electron beam into a process chamber. Diamond-like carbon (DLC) films prepared by EBEP-CVD systems were investigated for deposition rate, dynamic hardness and microstructure. The substrate bias voltage, substrate position and source gas were varied as the deposition parameters. It was found that when a higher negative bias voltage was applied to the substrate during deposition, the concentration of the sp
3 sites, the size of the graphite crystallite and the total hydrogen content decreased, whereas the density increased. The differences in the substrate position and source gas strongly affected the microstructural properties of the deposited DLC films. |
doi_str_mv | 10.1016/S0925-9635(01)00743-9 |
format | article |
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3 sites, the size of the graphite crystallite and the total hydrogen content decreased, whereas the density increased. The differences in the substrate position and source gas strongly affected the microstructural properties of the deposited DLC films.</description><subject>Chemical vapor deposition</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Diamond-like carbon</subject><subject>Exact sciences and technology</subject><subject>Hardness</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Microstructure</subject><subject>Physics</subject><issn>0925-9635</issn><issn>1879-0062</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNqFkE1LxDAQhoMouK7-BKEXRQ_VJE3T5iSyfoLgQT1KmKZTjLZNTXYX99-b_VCPnuYwzzvD-xByyOgZo0yeP1HF81TJLD-h7JTSQmSp2iIjVhYqpVTybTL6RXbJXgjvlDKuBBuR1ysLnevrtLUfmBjwleuTxrZdSGocXLBTrJNqkWCLZurjrkLoEvwyq8XQQuggMW_YWQNtMofB-Z-gdf0-2WmgDXiwmWPycnP9PLlLHx5v7yeXD6nJZDlNAXkpKMiCi7JgdYaNhEZiUYPgtJKqYhmYXJbKCEVVwwEUF6AMj7CQFWZjcry-O3j3OcMw1Z0NBtsWenSzoHlBS8FyFsF8DRrvQvDY6MHbDvxCM6qXMvVKpl6a0pTplUytYu5o8wBCLNp46I0Nf-FYg0kmI3ex5jC2nVv0OhiLvcHa-ihQ187-8-kb1cqJyA</recordid><startdate>20020701</startdate><enddate>20020701</enddate><creator>Ban, Masahito</creator><creator>Ryoji, Makoto</creator><creator>Hasegawa, Takeshi</creator><creator>Mori, Yukitaka</creator><creator>Fujii, Sadao</creator><creator>Fujioka, Junzo</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20020701</creationdate><title>Diamond-like carbon films deposited by electron beam excited plasma chemical vapor deposition</title><author>Ban, Masahito ; Ryoji, Makoto ; Hasegawa, Takeshi ; Mori, Yukitaka ; Fujii, Sadao ; Fujioka, Junzo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c368t-ae2840a6724871d3ef6af6e7da420b69b13ac5689c4909f2aa924a9c271d46be3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><topic>Chemical vapor deposition</topic><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Diamond-like carbon</topic><topic>Exact sciences and technology</topic><topic>Hardness</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Microstructure</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ban, Masahito</creatorcontrib><creatorcontrib>Ryoji, Makoto</creatorcontrib><creatorcontrib>Hasegawa, Takeshi</creatorcontrib><creatorcontrib>Mori, Yukitaka</creatorcontrib><creatorcontrib>Fujii, Sadao</creatorcontrib><creatorcontrib>Fujioka, Junzo</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Diamond and related materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ban, Masahito</au><au>Ryoji, Makoto</au><au>Hasegawa, Takeshi</au><au>Mori, Yukitaka</au><au>Fujii, Sadao</au><au>Fujioka, Junzo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Diamond-like carbon films deposited by electron beam excited plasma chemical vapor deposition</atitle><jtitle>Diamond and related materials</jtitle><date>2002-07-01</date><risdate>2002</risdate><volume>11</volume><issue>7</issue><spage>1353</spage><epage>1359</epage><pages>1353-1359</pages><issn>0925-9635</issn><eissn>1879-0062</eissn><abstract>An electron beam excited plasma (EBEP) system can produce a high-density plasma by introducing a high-current and low-energy electron beam into a process chamber. Diamond-like carbon (DLC) films prepared by EBEP-CVD systems were investigated for deposition rate, dynamic hardness and microstructure. The substrate bias voltage, substrate position and source gas were varied as the deposition parameters. It was found that when a higher negative bias voltage was applied to the substrate during deposition, the concentration of the sp
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subjects | Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Diamond-like carbon Exact sciences and technology Hardness Materials science Methods of deposition of films and coatings film growth and epitaxy Microstructure Physics |
title | Diamond-like carbon films deposited by electron beam excited plasma chemical vapor deposition |
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