Copper phthalocyanine film grown by vacuum deposition under magnetic field

• Published in: Thin solid films 2002, Vol.402 (1), p.79-82
• Main Authors: Ji, Z.G, Wong, K.W, Tse, P.K, Kwok, R.W.M, Lau, W.M
• Format: Article
• Language: English
• Subjects: Atomic force microscopy (AFM); Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Deposition process; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Organic semiconductors; Other nonmetallic inorganics; Other nonmetals; Physics; Surface morphology; Vacuum deposition; Visible and ultraviolet spectra; X-Ray diffraction (XRD)
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/S0040-6090(01)01702-3

Copper phthalocyanine (CuPc) film with good orientation is always required when CuPc is to be used as an electronic functional layer in different device applications. In the present study, a magnetic field (∼6 mT) was applied during the vacuum deposition of CuPc. The CuPc film grown under such a magnetic field showed better orientation and a new stacking behavior as shown by X-ray diffraction study (XRD) and atomic force microscopy (AFM). In addition, the film grown under magnetic field exhibited different absorption characteristics in the UV-visible range. This demonstrates the potential of using magnetic field to optimize the growth of CuPc for various applications.