Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which...

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Bibliographic Details
Published in:Chemical communications (Cambridge, England) England), 2022-09, Vol.58 (77), p.185-188
Main Authors: Santoso, Albert, Damen, Afke, van Ommen, J. Ruud, van Steijn, Volkert
Format: Article
Language:English
Subjects:
Atmospheric pressure
Atomic layer epitaxy
Corrosion resistance
Polydimethylsiloxane
Titanium oxides
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Summary:We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS. Unique surface-subsurface treatment of PDMS by atomic layer deposition at atmosphere pressure increases solvent resistance by two orders of magnitude.
ISSN:1359-7345
1364-548X
1364-548X
DOI:10.1039/d2cc02402k