Dynamics of the leveling process of nanoindentation induced defects on thin polystyrene films

Atomic Force Microscopy (AFM) was used to study the effect of nanoindentation induced defects on 50 and 120 nm thick unentangled polystyrene (PS) films, spin cast on silicon (Si) substrates. Indents were produced with residual depths of penetration less than the film thickness level upon heating abo...

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Bibliographic Details
Published in:Polymer (Guilford) 2002-02, Vol.43 (4), p.1343-1348
Main Authors: KARAPANAGIOTIS, I, EVANS, D. F, GERBERICH, W. W
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Organic polymers
Physicochemistry of polymers
Properties and characterization
Surface properties
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Summary:Atomic Force Microscopy (AFM) was used to study the effect of nanoindentation induced defects on 50 and 120 nm thick unentangled polystyrene (PS) films, spin cast on silicon (Si) substrates. Indents were produced with residual depths of penetration less than the film thickness level upon heating above the glass transition temperature (Tg) of bulk PS. The resulting leveling process is discussed in terms of a diffusion process driven by the curvature gradient. (Original abstract - amended)
ISSN:0032-3861
1873-2291
DOI:10.1016/S0032-3861(01)00688-7